RadTech forms new photopolymer AM alliance
November workshop to highlight photopolymer material opportunities for AM
RadTech, the non-profit association for UV+EB photopolymer chemistry, in cooperation with the National Institute of Standards and Technology (NIST), formed the Photopolymer Additive Manufacturing Alliance (PAMA), with a mission to engage industry, academia, government, and NGOs to advance materials and systems science for additive manufacturing.
To kick off the new group, PAMA will convene a three-part virtual workshop that will provide an overview and opportunities for photopolymer materials and systems characterization within additive manufacturing. The online workshop takes place on November 16, 17, and 18, 2021, from 1:00 PM – 3:00 PM EDT each day and will build on the success of the Photopolymer Additive Manufacturing Roadmap developed by NIST and RadTech in 2019.
“The Photopolymer Additive Manufacturing Roadmap developed from the workshop guided by NIST, and RadTech highlights key actions that must be taken for Photopolymer Additive Manufacturing to be a substantial contributor to global manufacturing,” said Mike Idacavage, Radical Curing LLC. “The Photopolymer Additive Manufacturing Alliance (PAMA) Webinars in November will be a significant step to accelerate photopolymer additive manufacturing collaboration and research.”
The workshop will feature an overview of PAMA, interactive networking sessions with focused topics, and an open discussion regarding the state-of-the-art tools and methods to characterize PAM materials. Invited panelists include Jeff Stansbury, University of Colorado Denver Anschutz; Stephanie Benight, Tactile Material Solutions; Neil Cramer, Arkema; H. Jerry Qi, Georgia Institute of Technology; Robert McLeod, University of Colorado Boulder; David Walker, Azul3D; Cameron Miller, NIST; Xiayun Zhao, University of Pittsburgh; and Dianne Poster, NIST.
