3D Printer HardwareMicro 3D printing

Nanoscribe inaugurates Shanghai demolab

German company makes its next-generation Aligned Two-Photon Lithography technology available for hands-on experience in China

Stay up to date with everything that is happening in the wonderful world of AM via our LinkedIn community.

Nano-3D printing market leader Nanoscribe has opened its Shanghai Quantum X demolab, bringing next-generation 3D microfabrication technology to China amid growing global industrial demand.

The strategic move is part of recognizing the Chinese market’s growing photonics, optics, and advanced manufacturing ecosystem, and the facility will make Nanoscribe’s Quantum X align system a focal point as local industry customers get the opportunity to see the company’s next-generation Aligned Two-Photon Lithography technology up close.

Quantum X align is a high-performance two-photon lithography system designed for high-resolution 3D laser lithography, with automated alignment on fibers, chips, and wafers. It’s designed to address key challenges in high-precision microfabrication.

“The Shanghai Quantum X demolab is more than a local facility – it represents a milestone in our long-term commitment to the Chinese market,” stated Martin Hermatschweiler, CEO and co-founder of Nanoscribe. “By providing access to high-throughput two-photon lithography instrumentation, we enable our customers to accelerate development cycles and bridge the gap from academic proof of concept to industrial-scale production. This is how we actively support the transition from ‘lab to fab’.”

Nanoscribe has opened its Shanghai Quantum X demolab, bringing next-generation 3D microfabrication technology to China

The system uses Nanoscribe’s proprietary lithography technologies: Two-Photon Grayscale Lithography (2GL) and Aligned 2-Photon Lithography (A2PL). 2GL enables continuous voxel modulation within a single scan process, which the company claims boosts printing speeds by a factor of 10 to 60 compared to traditional approaches.

A2PL enables precision 3D printing directly onto existing components and prepatterned substrates, such as optical fibers, photonic chips, and wafers. It has a claimed lateral alignment accuracy of down to 100 nm relative to markers and fiducials and enables scalable photonic packaging workflows.

The inauguration event included a live demo of Quantum X align, and the facility is now fully operational, giving Nanoscribe a dedicated environment in the region for client hands-on tech evaluation, collaboration, studies, training, and application development support.

Related Articles

Leave a Reply

Your email address will not be published. Required fields are marked *

Back to top button